CVD Coatings - Chemical Vapor Deposition
•Special tough fibrous structure improves wear and fracture resistance.
•It covers a wide application range and thus reduces the number of tools required.
Chemical Vapor Deposition (CVD) is an atmosphere controlled process conducted at elevated temperatures (~1925° F) in a CVD reactor. During this process, thin-film coatings are formed as the result of reactions between various gaseous phases and the heated surface of substrates within the CVD reactor. As different gases are transported through the reactor, distinct coating layers are formed on the tooling substrate. For example, TiN is formed as a result of the following chemical reaction:
TiCl4 + N2 + H2 1000° C → TiN + 4 HCl + H2. Titanium carbide (TiC) is formed as the result of the following chemical reaction: TiCl4 + CH4 + H2 1030° C → TiC + 4 HCl + H2. The final product of these reactions is a hard, wear-resistant coating that exhibits a chemical and metallurgical bond to the substrate. CVD coatings provide excellent resistance to the types of wear and galling typically seen during many metal-forming applications.
CVD coatings are used in many manufacturing applications as a wear-resistant coating: carbide milling and turning inserts, wear components, some plastic processing tools, etc. However, the most common application for CVD coating is for metal-forming tools.